Oxide growth on silicides in oxygen plasma
- 1 January 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 36 (1-4) , 185-195
- https://doi.org/10.1016/0169-4332(89)90913-6
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- Low-temperature plasma anodization of tantalum silicidesJournal of Applied Physics, 1987
- Algorithms for the rapid simulation of Rutherford backscattering spectraNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1985
- Microanalysis by the direct observation of nuclear reactions using a 2 MeV Van de GraaffNuclear Instruments and Methods, 1971
- General Relationship for the Thermal Oxidation of SiliconJournal of Applied Physics, 1965
- Silicon Oxidation in an Oxygen Plasma Excited by MicrowavesJournal of Applied Physics, 1965