Evaluation of the influence of process factors on plasma developed X‐ray resist properties
- 1 December 1983
- journal article
- research article
- Published by Wiley in Polymer Engineering & Science
- Vol. 23 (18) , 1029-1038
- https://doi.org/10.1002/pen.760231811
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Organosilicon monomers for plasma-developed x-ray resistsJournal of Vacuum Science and Technology, 1981
- A Negative‐Working Plasma‐Developed PhotoresistJournal of the Electrochemical Society, 1981
- Plasma‐Developed X‐Ray ResistsJournal of the Electrochemical Society, 1980