Surface Reaction Induced by Multiply-Charged Ions

Abstract
The surface reactions induced by an electronic potential energy of multiply-charged ions are investigated. A small electron-beam impact type ion source for production of multiply-charged ions was manufactured for this study. The charge state distribution of multiply-charged ions produced in the ion source greatly depends on the sample gas pressure and the potential barrier for ion trapping. In operation with an electron current of 7 mA at 2 keV, the ion-beam currents obtained for Ar5+ and Ar10+ are respectively at least 7 pA and 2× 10-3 pA. H+ ion desorption from a lightly etched GaAs surface are observed by bombarding with Ar q+ ions (q=1–3). The desorption yield of H+ per Ar q+ increases proportionally with the sixth power of the charge state of Ar q+. This charge state effect is discussed from the viewpoint of the electronic interaction between the GaAs surface and Ar q+ ions.

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