Operation of III-V Semiconductor Photocathodes in the Semitransparent Mode
- 1 June 1970
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 41 (7) , 2888-2894
- https://doi.org/10.1063/1.1659333
Abstract
Calculations show that very nearly bulk quality material is required for high‐efficiency semitransparent III‐V photocathodes. For narrow‐band response, this can be obtained by epitaxially growing a thin layer of a semiconductor whose bandgap is slightly less than that of the substrate. Cathodes made by growing GaAsSb on GaAs have given quantum efficiencies comparable with front surface values, peaking out at 0.54% at 1.35 eV near the onset of absorption in the GaAs substrate. Preliminary results demonstrating semitransparent yield at 1.06 μ of 0.013% are also shown.This publication has 5 references indexed in Scilit:
- Liquid Epitaxial Growth of GaAsSb and Its Use as a High-Efficiency, Long-Wavelength Threshold PhotoemitterJournal of Applied Physics, 1970
- Transport Properties of GaAs Obtained from Photoemission MeasurementsPhysical Review B, 1969
- EFFECTS OF HEAT CLEANING ON THE PHOTOEMISSION PROPERTIES OF GaAs SURFACESApplied Physics Letters, 1969
- Gallium Arsenide Thin-film PhotocathodesPublished by Elsevier ,1969
- PHOTOEMISSION FROM InP-Cs-OApplied Physics Letters, 1968