I n s i t u measurement of stress in Co/Cu, Co/Pd, and Co/Au compositionally modulated multilayer films
- 1 November 1990
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 68 (9) , 4569-4572
- https://doi.org/10.1063/1.346163
Abstract
Temporal changes of sign and magnitude of the intrinsic stress during ultra‐high vacuum deposition of Co/Cu, Co/Pd, and Co/Au compositionally modulated multilayer films (CMF’s) were investigated by means of a cantilever technique. The intrinsic stress corresponding to monatomic layers could be detected during deposition. The intrinsic stress in Co layers deposited on Cu, Pd, and Au layers is tensile and the stress of Cu, Pd, and Au layers on Co is compressive. The intrinsic stress of a Co layer on Cu in Co/Cu CMF approaches near to the ideal critical shear stress of the perfect crystal, 1×1011 dyn/cm2.This publication has 7 references indexed in Scilit:
- Mechanical stresses in (sub)monolayer epitaxial filmsPhysical Review Letters, 1990
- Magnetostriction of 3d-transition metal/noble metal compositionally modulated multilayer filmsJournal of Applied Physics, 1988
- Fabrication and Structure of Co/Cu Artificial SuperlatticesIEEE Translation Journal on Magnetics in Japan, 1988
- Fabrication and structure of Co/Cu artificial superlattices.Journal of the Magnetics Society of Japan, 1987
- Ferromagnetism of very thin films of nickel and cobaltJournal of Magnetism and Magnetic Materials, 1986
- Perpendicular magnetic anisotropy in Pd/Co thin film layered structuresApplied Physics Letters, 1985
- Intrinsic Stress in Evaporated Metal FilmsJournal of Vacuum Science and Technology, 1969