Core-level shifts and oxidation states of Ta and W: Electron spectroscopy for chemical analysis applied to surfaces
- 15 December 1984
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 30 (12) , 7236-7241
- https://doi.org/10.1103/physrevb.30.7236
Abstract
Surface-sensitive core-level photoelectron spectra are presented for surface oxide phases of Ta and W in the monolayer range. Discrete chemically shifted core levels are observed which are up to 5 times sharper than in bulk oxides. A simple model is proposed for explaining the wealth of corelevel shifts in terms of discrete oxidation states. Application of concepts from electron spectroscopy for chemical analysis yields a chemical shift of ≈0.42 eV per metal—oxygen bond for surface oxide phases. With this interpretation, Ta exhibits predominantly odd oxidation states (1,3,5) and W even oxidation states (2,4,6). In addition to the chemical shift, a relaxation shift of 2-3 eV has to be included for insulating oxides which accounts for the lack of metallic screening. Discrete configurations with characteristic core-level intensities and shifts are found in Ta.Keywords
This publication has 13 references indexed in Scilit:
- Contribution à l'étude de la réaction TaO2 aux températures élevées et aux basses pressions II: Étude par spectroscopie électronique pour analyse chimiqueJournal of the Less Common Metals, 1983
- XPS studies on WO2.90 and WO2.72 and the influence of metallic impuritiesJournal of Solid State Chemistry, 1983
- Multiple-bonding configurations for oxygen on silicon surfacesPhysical Review B, 1983
- Auger electron spectroscopy and X-ray photoelectron spectroscopy studies of the oxidation of polycrystalline tantalum and niobium at room temperature and low oxygen pressuresJournal of the Less Common Metals, 1983
- Chemisorption-induced-core-electron binding-energy shifts for surface atoms of W(111), W(100), and Ta(111)Physical Review B, 1982
- Study of the W (Ta) core level shifts induced by the adsorption of oxygen on tungsten (tantalum) (110)Journal of Physics C: Solid State Physics, 1981
- An ellipsoidal mirror display analyzer system for electron energy and angular measurementsNuclear Instruments and Methods, 1980
- Combined SIMS, AES, and XPS investigations of tantalum oxide layersApplied Physics A, 1979
- Structure des Oxides de TantaleJapanese Journal of Applied Physics, 1967
- Identification of Molybdenum and Tungsten Oxides by X-Ray Powder PatternsAnalytical Chemistry, 1952