Generation Rule of the Slip Dislocation in LEC GaAs Crystal
- 1 July 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (7A) , L530-533
- https://doi.org/10.1143/jjap.25.l530
Abstract
In a (001) low dislocation density wafer, an eight-fold circular strain field was observed near the periphery between and radii. The observed result was explained from the viewpoint of ease of slip dislocation generation by calculation of Schmid factor magnitude distribution under the condition that major thermal stress was applied to tangential direction at the round ingot surface. While, in a (001) high dislocation density wafer, a four-fold strain field was observed around the radii. The result was explained by intersection of slip dislocation generated from eight positions at the periphery between and radii as well.Keywords
This publication has 2 references indexed in Scilit:
- Synchrotron Plane Wave X-Ray Topography of GaAs with a Separate (+, +) Monochro-CollimatorJapanese Journal of Applied Physics, 1985
- Inhomogeneous GaAs FET Threshold Voltages Related to Dislocation DistributionJapanese Journal of Applied Physics, 1982