Formation processes of particulates in helium-diluted silane RF plasmas
- 1 April 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 22 (2) , 103-109
- https://doi.org/10.1109/27.279011
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
- Growth Kinetics and Behavior of Dust Particles in Silane PlasmasJapanese Journal of Applied Physics, 1993
- Electron attachment to Cn clusters (n≤30)The Journal of Chemical Physics, 1993
- Detection of Negative Ions in a Helium-Silane RF PlasmaJapanese Journal of Applied Physics, 1992
- Measurement of SiH2 Densities in an RF-Discharge Silane Plasma Used in the Chemical Vapor Deposition of Hydrogenated Amorphous Silicon FilmJapanese Journal of Applied Physics, 1992
- Sequential reactions of SiD+2 with SiD4The Journal of Chemical Physics, 1992
- Sequential clustering reactions of SiD+ with SiD4: Rapid growth to kinetic dead-end structuresThe Journal of Chemical Physics, 1991
- How Langmuir Probes WorkPublished by Elsevier ,1989
- Mechanism of electron attachment to van der Waals clusters: Application to carbon dioxide clustersThe Journal of Chemical Physics, 1987
- Photodetachment and photofragmentation studies of semiconductor cluster anionsThe Journal of Chemical Physics, 1986
- GaAlAs buried multiquantum well lasers fabricated by diffusion-induced disorderingApplied Physics Letters, 1984