Properties of indium tin oxide (ITO) films prepared by r.f. reactive magnetron sputtering at different pressures
- 1 July 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 303 (1-2) , 151-155
- https://doi.org/10.1016/s0040-6090(97)00050-3
Abstract
No abstract availableKeywords
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