Effects of oxygen partial pressure on the microstructure and electrical properties of indium tin oxide film prepared by d.c. magnetron sputtering
- 1 March 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 258 (1-2) , 274-278
- https://doi.org/10.1016/0040-6090(94)06354-0
Abstract
No abstract availableKeywords
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