Mechanistic studies of the initial stages of etching of Si and SiO2 in a CHF3 plasma
- 1 September 1990
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 45 (2) , 109-120
- https://doi.org/10.1016/0169-4332(90)90061-4
Abstract
No abstract availableThis publication has 23 references indexed in Scilit:
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