Crystallization of amorphous silicon on silica by cw laser irradiation
- 15 January 1982
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 40 (2) , 166-168
- https://doi.org/10.1063/1.93030
Abstract
Laser crystallization was performed by scanning the substrate through a stationary cw Ar+ laser beam. Amorphous films show two abrupt changes in the optical transmission spectra as a function of laser power. At the first step no grains are observed with 10‐nm resolution. The second optical change is accompanied by clear crystallinity with grains from submicron to several 100‐μm size.Keywords
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