Physical Properties and Structure of Rf‐Sputtered Amorphous Films in the System Ti02‐Si02
- 1 January 1984
- journal article
- Published by Wiley in Journal of the American Ceramic Society
- Vol. 67 (1) , 52-56
- https://doi.org/10.1111/j.1151-2916.1984.tb19147.x
Abstract
No abstract availableKeywords
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