A micromachined low-power temperature-regulated bandgap voltage reference
- 1 January 1995
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Journal of Solid-State Circuits
- Vol. 30 (12) , 1374-1381
- https://doi.org/10.1109/4.482164
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Diode-based Thermal Rms Converter With On-chip Circuitry Fabricated Using Standard CMOS TechnologyPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2005
- 3D structures with piezoresistive sensors in standard CMOSPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2005
- Tin oxide gas sensor fabricated using CMOS micro-hotplates and in-situ processingIEEE Electron Device Letters, 1993
- Silicon gas flow sensors using industrial CMOS and bipolar IC technologySensors and Actuators A: Physical, 1991
- TMAHW etchants for silicon micromachiningPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1991
- A new approach for the fabrication of micromechanical structuresSensors and Actuators, 1989
- CMOS voltage references using lateral bipolar transistorsIEEE Journal of Solid-State Circuits, 1985
- The etching of silicon with XeF2 vaporApplied Physics Letters, 1979
- A simple three-terminal IC bandgap referenceIEEE Journal of Solid-State Circuits, 1974
- Analysis of Electrothermal Integrated CircuitsIEEE Journal of Solid-State Circuits, 1971