Control of plasma parameters and electric fields in a microwave-rf hybrid plasma
- 15 May 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (10) , 6114-6117
- https://doi.org/10.1063/1.345172
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Observation of sheath structure near a rf electrode in a magnetized afterglow plasmaJournal of Applied Physics, 1989
- Production of a low-pressure processing plasma with ion beam injection for thin-film preparationApplied Physics Letters, 1988
- Characteristics of Microwave Plasma and Preparation of a-Si Thin FilmJapanese Journal of Applied Physics, 1987
- Measurements of Fast Time Evolutions of Plasma Potential Using Emissive ProbeJapanese Journal of Applied Physics, 1983