Structure and chemical composition of W-C-(Co) sputtered films
- 1 March 1991
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 197 (1-2) , 237-255
- https://doi.org/10.1016/0040-6090(91)90235-p
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
- Preparation of W-C thin films by reactive R.F. sputtering and Auger electron spectroscopy surface characterizationThin Solid Films, 1988
- Mechanical properties of R.F. magnetron sputtered W-C films on stainless steelThin Solid Films, 1988
- Investigation of cosputtered W–C thin films as diffusion barriersJournal of Vacuum Science & Technology A, 1988
- Cosputtered W75C25 thin film diffusion barriersThin Solid Films, 1988
- Characterization of cosputtered tungsten carbide thin filmsThin Solid Films, 1988
- Reactive and non-reactive high rate sputter deposition of Tungsten carbideThin Solid Films, 1987
- Very hard W–C coatings on stainless steel by rf reactive magnetron sputteringJournal of Vacuum Science & Technology A, 1986
- R.F. magnetron sputtered tungsten carbide thin filmsBulletin of Materials Science, 1986
- High rate reactive magnetron sputtered tungsten carbide filmsJournal of Vacuum Science & Technology A, 1985
- Synthesis of tungsten carbide films by rf magnetron sputteringJournal of Vacuum Science & Technology A, 1984