Metrology of pulsed radiation for 157-nm lithography
- 1 December 2002
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 41 (34) , 7167-7172
- https://doi.org/10.1364/ao.41.007167
Abstract
In the framework of current developments in 157-nm lithography we have investigated the performance of photodetectors with emphasis to their stability and linearity. The measurements were performed in the radiometry laboratories of the Physikalisch-Technische Bundesanstalt at the Berlin electron-storage rings BESSY I and BESSY II with spectrally dispersed synchrotron radiation as well as with highly pulsed F2 laser radiation at 157 nm in combination with a cryogenic radiometer as the primary detector standard. Relative standard uncertainties of as little as 1% were achieved for the calibration of photodetectors in the spectral range of ultraviolet and vacuum-ultraviolet radiation.Keywords
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