Surface cleaning of Si(100) and Ag/Si(100): Characterisation by SEM, AES and RHEED
- 2 February 1984
- journal article
- Published by Elsevier in Surface Science Letters
- Vol. 137 (2-3) , L92-L96
- https://doi.org/10.1016/0167-2584(84)90871-5
Abstract
No abstract availableKeywords
This publication has 16 references indexed in Scilit:
- A LEED-AES study of the growth of Ag films on Si(100)Surface Science, 1982
- Silicide surface phases on goldJournal of Applied Physics, 1981
- A leed-aes study of thin Pd films on Si(111) and (100) substratesSurface Science, 1980
- Reduction of oxides on silicon by heating in a gallium molecular beam at 800 °Ca)Applied Physics Letters, 1980
- Double diffraction spots in RHEED patterns from clean Ge(111) and Si(001) surfacesSurface Science, 1979
- Formation of iridium silicides from Ir thin films on Si substratesJournal of Applied Physics, 1979
- LEED-AES study of the AuSi(100) systemSurface Science, 1979
- Acceptor dopants in silicon molecular-beam epitaxyJournal of Applied Physics, 1977
- Formation, structure, and orientation of gold silicide on gold surfacesJournal of Applied Physics, 1976
- Silicon Cleaning with Hydrogen Peroxide Solutions: A High Energy Electron Diffraction and Auger Electron Spectroscopy StudyJournal of the Electrochemical Society, 1972