Template fabrication schemes for step and flash imprint lithography
- 31 July 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 61-62, 461-467
- https://doi.org/10.1016/s0167-9317(02)00462-8
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Step and flash imprint lithography: Template surface treatment and defect analysisJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Plasma etching of Cr: a multiparameter uniformity study utilizing patterns of various Cr loadsPublished by SPIE-Intl Soc Optical Eng ,1999
- Step and flash imprint lithography: a new approach to high-resolution patterningPublished by SPIE-Intl Soc Optical Eng ,1999
- Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applicationsMicroelectronic Engineering, 1999
- Uniform low stress oxynitride films for application as hardmasks on x-ray masksJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997