Magnesium Oxide Thin Films Prepared by Chemical Vapor Deposition from Magnesium 2-Ethylhexanoate
- 1 May 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (5A) , L810
- https://doi.org/10.1143/jjap.29.l810
Abstract
Magnesium oxide thin films were prepared by a low-temperature atmospheric-pressure chemical vapor deposition method. The raw material was magnesium 2-ethylhexanoate, which is nontoxic and easy to handle. The deposition can be carried out in air. At a reaction temperature above 450°C, a highly [100]-oriented polycrystalline film can be obtained on amorphous substrates.Keywords
This publication has 2 references indexed in Scilit:
- Microstructure and Superconductivity in Epitaxial MgO/NbN MultilayersJapanese Journal of Applied Physics, 1989
- Metalorganic chemical vapor deposition of [100] textured MgO thin filmsApplied Physics Letters, 1989