Metalorganic chemical vapor deposition of [100] textured MgO thin films
- 19 June 1989
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 54 (25) , 2542-2544
- https://doi.org/10.1063/1.101044
Abstract
We report on the results of a recent study on the deposition of [100] textured MgO films on fused quartz substrates by using the metalorganic chemical vapor deposition technique. Magnesium β‐diketonate was used as the metal source and the growth rate of the film was about 0.4 μm/h at 740 °C in a horizontal warm wall reactor. X‐ray diffraction experiments provided evidence that the MgO films on fused quartz were fully textured with [100] orientation perpendicular to the substrate surface. The films had a very smooth surface morphology and optical transparency with an index of refraction of 1.71.Keywords
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