The effects of deposition parameters on a-Si:H films fabricated by microwave glow discharge techniques
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 727-730
- https://doi.org/10.1016/0022-3093(83)90274-0
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Compositional characterization of microwave plasma a-Si: H filmsCanadian Journal of Physics, 1983
- Microwave sputtering system for the fabrication of thin solid filmsReview of Scientific Instruments, 1982
- Structural interpretation of the vibrational spectra of-Si: H alloysPhysical Review B, 1979