Resistive layers formed by ion implantation into metal films
- 1 May 1970
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 5 (5-6) , R59-R62
- https://doi.org/10.1016/0040-6090(70)90120-3
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Isolating surface layers on metallic conductors produced by ion bombardmentThin Solid Films, 1969
- Effect of ion bombardment on the adhesion of aluminium films on glassThin Solid Films, 1969
- A Comparative Study of Anodized, Evaporated, and Sputtered Aluminum Oxide Thin FilmsJournal of Vacuum Science and Technology, 1969
- Electrical conduction in amorphous silicon and germaniumThin Solid Films, 1968
- Electronic properties of amorphous dielectric filmsThin Solid Films, 1967
- Reactively sputtered titanium resistors, capacitors and rectifiers for microcircuitsMicroelectronics Reliability, 1967
- Formation of SiO2 Films by Oxygen-Ion BombardmentJapanese Journal of Applied Physics, 1966