Plasma etching of dielectric films using the non-global-warming gas CF3I
- 31 March 1998
- journal article
- Published by Elsevier in Materials Letters
- Vol. 34 (3-6) , 415-419
- https://doi.org/10.1016/s0167-577x(97)00209-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Plasma enhanced chemical vapor deposition of Si-N-C-H films from environmentally benign organosilanesMaterials Letters, 1995
- Ozone depletion and global warming potentials of CF3IJournal of Geophysical Research: Atmospheres, 1994
- Atmospheric Lifetimes of Long-Lived Halogenated SpeciesScience, 1993