The use of a novel image‐shearing technique on a scanning electron microscope for comparative measurement of linewidths on photomasks
- 1 January 1989
- Vol. 11 (5) , 213-217
- https://doi.org/10.1002/sca.4950110503
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Linewidth metrology for x-ray masks with subhalfmicron feature sizeMicroelectronic Engineering, 1987
- Edge Recognition in SEM MetrologyPublished by SPIE-Intl Soc Optical Eng ,1986
- Application Of Optical Microscopy To Dimensional Measurements In MicroelectronicsPublished by SPIE-Intl Soc Optical Eng ,1983