Writing and reading bits on pre-patterned media
- 1 March 2004
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 84 (9) , 1519-1521
- https://doi.org/10.1063/1.1644341
Abstract
We have written and read back bits on perpendicular pre-patterned media prepared by electron-beam lithography. Using a contact tester equipped with a standard longitudinal head, we are able to write different bit lengths on dots spaced 100 nm apart. These tests demonstrate the role played by the distribution of the coercive fields of the dots during the write process. Signal-to-noise ratios (SNRs) are obtained by numerical analysis and are found to be on the same order of magnitude as in continuous perpendicular media, but remain constant at decreasing bit lengths. This property of the SNR is due to a partial reduction of transition noise. The potential to pattern these media with nanoimprint lithography and their good recording performance make them candidates for ultrahigh density recording.
Keywords
This publication has 12 references indexed in Scilit:
- Domain structure in magnetic dots prepared by nanoimprint and e-beam lithographyJournal of Applied Physics, 2002
- Writing of high-density patterned perpendicular media with a conventional longitudinal recording headApplied Physics Letters, 2002
- Patterning of granular magnetic media with a focused ion beam to produce single-domain islands at <140 Gbit/in/sup 2/IEEE Transactions on Magnetics, 2001
- Monodisperse FePt Nanoparticles and Ferromagnetic FePt Nanocrystal SuperlatticesScience, 2000
- Domain structure of magnetic layers deposited on patterned siliconApplied Physics Letters, 1999
- Ion-beam patterning of magnetic films using stencil masksApplied Physics Letters, 1999
- Nanoimprint lithography for a large area pattern replicationMicroelectronic Engineering, 1999
- Dynamic coercivity measurements in thin film recording media using a contact write/read testerJournal of Applied Physics, 1999
- Dynamics of the magnetization reversal in Au/Co/Au micrometer-size dot arraysPhysical Review B, 1998
- Sub-10 nm imprint lithography and applicationsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1997