Interface Effects Study in Hard–Soft Carbon Multilayered Films by AES Depth Profiling
- 1 April 2007
- journal article
- research article
- Published by Wiley in Plasma Processes and Polymers
- Vol. 4 (S1) , S259-S264
- https://doi.org/10.1002/ppap.200730713
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Characterization of nanolayers by sputter depth profilingApplied Surface Science, 2005
- Stress characteristics in EUV mask Mo/Si multilayers deposited by ion beam sputteringMicroelectronic Engineering, 2002
- Hard coatings for mechanical applicationsVacuum, 2002
- Amorphous hydrogenated carbon films as barrier for gas permeation through polymer filmsDiamond and Related Materials, 2000
- Sputter depth profile analysis of interfacesReports on Progress in Physics, 1998
- INTERFACIAL AND SURFACE MICROCHEMISTRYPublished by Elsevier ,1996
- High resolution compositional depth profilingJournal of Vacuum Science & Technology A, 1991
- Redeposition in AES sputter depth profiling of multilayer Cr/Ni thin filmsSurface and Interface Analysis, 1988
- Characterization of NBS Standard Reference Material 2135 for sputter depth profile analysisJournal of Vacuum Science & Technology A, 1985
- General Aspects of Trace Analytical Methods—IV. Recommendations for Nomenclature, Standard Procedures and Reporting of Experimental Data for Surface Analysis TechniquesPure and Applied Chemistry, 1979