Sputter depth profile analysis of interfaces
- 1 July 1998
- journal article
- Published by IOP Publishing in Reports on Progress in Physics
- Vol. 61 (7) , 827-888
- https://doi.org/10.1088/0034-4885/61/7/002
Abstract
No abstract availableKeywords
This publication has 200 references indexed in Scilit:
- AES depth profiling of passive overlayers formed on nickel alloysSurface and Interface Analysis, 1990
- Improvement of crater-edge profiling for the characterization of superlattice structuresSurface and Interface Analysis, 1989
- Reduction of charging in surface analysis of insulating materials by AESSurface and Interface Analysis, 1989
- Ion beam induced roughness and its effect in AES depth profiling of multilayer Ni/Cr thin filmsSurface and Interface Analysis, 1988
- On the development of increasing surface roughness during ion sputteringThin Solid Films, 1987
- Depth resolution improvement in AES sputter profiling of Ni/Cr multilayers on rough substrates using two ion beamsSurface and Interface Analysis, 1987
- Auger electron spectroscopy depth profiling during sample rotationSurface and Interface Analysis, 1986
- On the influence of ion energy and incidence angle on Auger depth profiles of binary alloysApplications of Surface Science, 1982
- ESCA study of the passive layer on Sn-Ni alloyJournal of Vacuum Science and Technology, 1977
- Quantitative Detection of Oxygen in Silicon Nitride on SiliconJournal of the Electrochemical Society, 1976