A laser-generated plasma source for x-ray lithography and VLSI
- 1 October 1988
- journal article
- Published by IOP Publishing in Journal of Physics E: Scientific Instruments
- Vol. 21 (10) , 959-965
- https://doi.org/10.1088/0022-3735/21/10/011
Abstract
Plasma sources based on small, commercially available, Nd:YAG and KrF excimer lasers are described, with particular emphasis on the potential use of such sources in x-ray lithography. The results obtained from the characterisation of prototype systems are extrapolated to allow the specification of a source that could be used in a production system, and the predicted properties of this source are compared with other possibilities for x-ray lithography.Keywords
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