Measurement of negative-ion-production efficiencies and development of a dc operation sputter-type negative ion source

1 April 1992

journal article
research article
Published by AIP Publishing in Review of Scientific Instruments

Vol. 63 (4) , 2488-2490
https://doi.org/10.1063/1.1142921

Abstract

For the development of a high current heavy negative ion source, the production efficiency of the negative ions by Xe⁺ sputtering with cesium and electron detachment cross sections in xenon gas were measured. The maximum efficiency for Cu⁻ was 12.1% and the single‐electron detachment cross section was found to be of the order of 0.6–1.4 × 10⁻¹⁵ cm² in the energy range of 5–50 keV. Based on the results of these fundamental experiments, a plasma‐sputter‐type heavy negative ion source has been constructed, in which the plasma was generated at a rf‐frequency of 13.56 MHz. A total negative ion current of 2.5 mA was obtained without electrons from the source in dc operation, and the Cu⁻ current was detected to be 91% of the total beam. The operation characteristics are described.

Keywords

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