Direction of topography dependent damage current during plasma etching

This publication has 4 references indexed in Scilit:

• Assessment of charge-induced damage to ultra-thin gate MOSFETs
  Published by Institute of Electrical and Electronics Engineers (IEEE) ,2002
• Dual Function of Thin MoO₃ and WO₃ Films as Negative and Positive Resists for Focused Ion Beam Lithography
  Japanese Journal of Applied Physics, 1996
• Charge Damage Caused by Electron Shading Effect
  Japanese Journal of Applied Physics, 1994
• New Phenomena of Charge Damage in Plasma Etching: Heavy Damage Only through Dense-Line Antenna
  Japanese Journal of Applied Physics, 1993