In situ film thickness measurement and gaseous species detection in diamond CVD processes using FTIR emission spectroscopy
- 31 December 1994
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 68-69, 394-397
- https://doi.org/10.1016/0257-8972(94)90192-9
Abstract
No abstract availableKeywords
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