Structural information from the Raman spectrum of amorphous silicon
- 15 July 1985
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 32 (2) , 874-878
- https://doi.org/10.1103/physrevb.32.874
Abstract
The Raman scattering from various model structures for amorphous silicon is computed. It is shown that the width of the ‘‘optic peak’’ increases roughly linearly with the rms bond-angle distortion Δ of the network. The experimentally observed linewidths lead to 7.7°≤Δ≤10.5°. The smaller linewidths (and hence angles) correspond to networks that have been annealed at higher temperatures. These results are consistent with model-building experience which shows that it is impossible to construct fully bonded amorphous networks with Δ≤6.6°.
Keywords
This publication has 10 references indexed in Scilit:
- Determination of energy barrier for structural relaxation in a-Si and a-Ge by Raman scatteringJournal of Non-Crystalline Solids, 1984
- Vibrational properties of elemental amorphous semiconductorsAdvances in Physics, 1977
- Computer restructuring of continuous random tetrahedral networksPhysical Review B, 1975
- Vibrational properties of amorphous Si and GePhysical Review B, 1975
- The range and kind of order in random tetrahedral structuresJournal of Non-Crystalline Solids, 1975
- Modeling the structure of amorphous tetrahedrally coordinated semiconductors. IPhysical Review B, 1974
- Relaxed continuous random network modelsJournal of Non-Crystalline Solids, 1974
- Structural model for amorphous silicon and germaniumJournal of Non-Crystalline Solids, 1971
- Raman-Scattering Selection-Rule Breaking and the Density of States in Amorphous MaterialsPhysical Review Letters, 1970
- Effect of Invariance Requirements on the Elastic Strain Energy of Crystals with Application to the Diamond StructurePhysical Review B, 1966