Thermal Stability of Self-Assembled Monolayers from Alkylchlorosilanes
- 1 January 1996
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 12 (11) , 2747-2755
- https://doi.org/10.1021/la950518u
Abstract
No abstract availableKeywords
This publication has 34 references indexed in Scilit:
- Structure changes in model membranes monitored by variable period x-ray standing waves: effect of Langmuir-Blodgett film thickness on thermal behaviorThe Journal of Physical Chemistry, 1994
- Patterning Self-Assembled Monolayers: Applications in Materials ScienceLangmuir, 1994
- Spatially Resolved Mineral Deposition on Patterned Self-Assembled MonolayersLangmuir, 1994
- Self-assembled monolayer electron beam resist on GaAsApplied Physics Letters, 1993
- Self-Assembled and Langmuir-Blodgett Organic Thin Films As Functional MaterialsMRS Bulletin, 1992
- An infrared study of the reaction of octadecyltrichlorosilane with silicaLangmuir, 1992
- Self‐assembled monolayers of alkyltrichiorosilanes: Building blocks for future organic materialsAdvanced Materials, 1990
- Self-assembly of octadecyltrichlorosilane monolayers on micaJournal of Materials Research, 1990
- Structure and reactivity of alkylsiloxane monolayers formed by reaction of alkyltrichlorosilanes on silicon substratesLangmuir, 1989
- Thermally induced disorder in organized organic monolayers on solid substratesThe Journal of Physical Chemistry, 1986