Optical projection lithography using lenses with numerical apertures greater than unity
- 1 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 31-36
- https://doi.org/10.1016/0167-9317(89)90008-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Use of a pi-phase shifting x-ray mask to increase the intensity slope at feature edgesJournal of Vacuum Science & Technology B, 1988
- A model for comparing process latitude in ultraviolet, deep-ultraviolet, and x-ray lithographyJournal of Vacuum Science & Technology B, 1988
- A Compact Optical Imaging System For Resist Process And Lithography ResearchPublished by SPIE-Intl Soc Optical Eng ,1988
- A critical examination of submicron optical lithography using simulated projection imagesJournal of Vacuum Science & Technology B, 1983
- Projection photolithography-liftoff techniques for production of 0.2-µm metal patternsIEEE Transactions on Electron Devices, 1981
- Partially coherent imaging in two dimensions and the theoretical limits of projection printing in microfabricationIEEE Transactions on Electron Devices, 1980
- Microscopic circuit fabrication on refractory superconducting filmsReview of Scientific Instruments, 1973