Structural and electrical properties of Al2O3 thin films on p-Si grown by low-pressure metalorganic chemical vapor deposition
- 1 March 1993
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 65-66, 854-857
- https://doi.org/10.1016/0169-4332(93)90768-7
Abstract
No abstract availableFunding Information
- Ministry of Education
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