Multipolar magnetic field structures for the scaling-up of high density plasmas excited in the d.c. to microwave frequency range and applicable to sputtering and chemical processing
- 1 December 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 76-77, 770-775
- https://doi.org/10.1016/0257-8972(95)02609-6
Abstract
No abstract availableKeywords
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