Characterisation by X-ray absorption spectroscopy of oxide thin films prepared by ion beam-induced CVD
- 1 December 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 377-378, 460-466
- https://doi.org/10.1016/s0040-6090(00)01436-x
Abstract
No abstract availableKeywords
This publication has 34 references indexed in Scilit:
- SnO2 thin films prepared by ion beam induced CVD: preparation and characterization by X-ray absorption spectroscopyThin Solid Films, 1999
- Characterization of metal ion-implanted titanium oxide photocatalysts operating under visible light irradiationJournal of Synchrotron Radiation, 1999
- In-situ EXAFS analysis of the local environment of Pt particles incorporated in thin films of SnO2 semi-conductor oxide used as gas-sensorsSensors and Actuators B: Chemical, 1998
- Ion‐Beam‐Induced CVD: An Alternative Method of Thin Film PreparationChemical Vapor Deposition, 1997
- Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. II. Preparation and characterization of AlxTiyOz thin filmsJournal of Vacuum Science & Technology A, 1996
- Structural characterization of PbTiO3 thin films prepared by ion beam induced CVD and evaporation of leadThin Solid Films, 1996
- Ion beam induced chemical vapor deposition procedure for the preparation of oxide thin films. I. Preparation and characterization of TiO2 thin filmsJournal of Vacuum Science & Technology A, 1994
- X-ray diffraction studies of thin films and multilayer structuresProgress in Crystal Growth and Characterization, 1989
- Conversion-electron extended x-ray-absorption fine-structure measurements of ion-damaged GaAsPhysical Review B, 1987
- Quantitative ion beam process for the deposition of compound thin filmsApplied Physics Letters, 1983