A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion
- 31 July 1994
- journal article
- Published by Elsevier in International Journal of Heat and Mass Transfer
- Vol. 37 (10) , 1535-1543
- https://doi.org/10.1016/0017-9310(94)90155-4
Abstract
No abstract availableKeywords
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