Concentration and Temperature Dependence of Impurity-to-Band Activation Energies
- 15 January 1972
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 5 (2) , 408-417
- https://doi.org/10.1103/physrevb.5.408
Abstract
The present paper investigates the cause of the experimentally well-known reduction of impurity activation (ionization) energies in the intermediate doping range. It is shown that this many-body problem can be reasonably approximated by a one-electron screened-impurity approach. Application of this result to literature data on GaP(Zn) gives agreement with the experimental results provided that screening by ionized impurities is included; screening by free carriers alone is insufficient. The inclusion of the ionized impurity screening thus for the first time provides a quantitative explanation for the observed reductions in activation energies. A corollary of the screening effect is that the activation energy decreases with increasing temperature; use of this temperature dependence clarifies previous discrepancies between Hall and neutron activation values for the Zn concentration in GaP.This publication has 29 references indexed in Scilit:
- Distribution of Impurities in Zn,O-Doped GaP Liquid Phase Epitaxy LayersJournal of the Electrochemical Society, 1970
- GaP RED ELECTROLUMINESCENT DIODES WITH AN EXTERNAL QUANTUM EFFICIENCY OF 7%Applied Physics Letters, 1969
- Conduction in non-crystalline systemsPhilosophical Magazine, 1968
- Impurity-Band Tails in the High-Density Limit. I. Minimum Counting MethodsPhysical Review B, 1966
- Broadening of Impurity Bands in Heavily Doped SemiconductorsPhysical Review B, 1965
- Description of Impurity Ionization in Semiconductors by Chemical ThermodynamicsPhysical Review B, 1961
- Electrical Properties of Germanium Semiconductors at Low TemperaturesPhysical Review B, 1955
- Electrical Properties of-Type GermaniumPhysical Review B, 1954
- Change of Activation Energy with Impurity Concentration in SemiconductorsProceedings of the Physical Society. Section A, 1951
- Electrical Properties of Pure Silicon and Silicon Alloys Containing Boron and PhosphorusPhysical Review B, 1949