Investigation of reactive diffusion in the thin-film system Cu-Ti
- 16 September 1975
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 31 (1) , 61-70
- https://doi.org/10.1002/pssa.2210310107
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Reduction of thermally grown SiO2 by Al filmsPhysica Status Solidi (a), 1974
- X-ray study of interdiffusion in bimetallic Cu–Au filmsJournal of Applied Physics, 1972
- Some aspects of the growth of diffusion layers in binary systemsJournal of Nuclear Materials, 1961
- Determination of the phase structure of metallic protective coatings by anodic dissolutionTransactions of the Faraday Society, 1935