Characteristics of R.F. plasma nitrided titanium alloys
- 1 December 1988
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 36 (1-2) , 183-190
- https://doi.org/10.1016/0257-8972(88)90148-x
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- The Ti-N system: Equilibrium between the δ, ϵ and α phases and the conditions of formation of the lobier and marcon metastable phaseJournal of the Less Common Metals, 1987
- Tempering effects in ion-plated TiN films: Texture, residual stress, adhesion and colourThin Solid Films, 1987
- Composition, morphology and mechanical properties of plasma-assisted chemically vapor-deposited TiN films on M2 tool steelThin Solid Films, 1986
- TiNx coatings prepared by d.c. reactive magnetron sputteringThin Solid Films, 1986
- High rate reactively sputtered TiN coatings on high speed steel drillsThin Solid Films, 1985
- Nitrogen implantation in titanium: RBS, THEED and TEM analysisVacuum, 1984
- Influence of the nitrogen partial pressure on the properties of d.c.-sputtered titanium and titanium nitride filmsThin Solid Films, 1984
- Titanium α- nitrogen solid solution formed by high temperature nitriding: diffusion of nitrogen, hardness, and crystallographic parametersMetallurgical Transactions A, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film compositionThin Solid Films, 1983
- Interrupted cutting tests of cemented carbide tools coated by physical vapor deposition and chemical vapor deposition techniquesThin Solid Films, 1982