Influence of the nitrogen partial pressure on the properties of d.c.-sputtered titanium and titanium nitride films
- 1 January 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 111 (4) , 339-349
- https://doi.org/10.1016/0040-6090(84)90326-2
Abstract
No abstract availableKeywords
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