Cross-sectional transmission electron microscopy of electroluminescent thin films fabricated by various deposition methods
- 1 September 1983
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 63 (1) , 47-57
- https://doi.org/10.1016/0022-0248(83)90426-8
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
- Thin Cd1−xZnxS films evaporated by electron bombardment I: structure of the filmsThin Solid Films, 1982
- Crystallographic Character of ZnO Thin Film Formed at Low Sputtering Gas PressureJapanese Journal of Applied Physics, 1982
- Grain structure of CdS and Cd1−xZnxS filmsThin Solid Films, 1981
- Preparation of ZnS films by reactive sputtering and their investigation by electron microscopy and Rutherford backscatteringThin Solid Films, 1981
- A device-oriented materials study of CdS and Cu2S films in solar cellsThin Solid Films, 1981
- Inhomogeneous interface laser mirror coatingsApplied Optics, 1979
- Characterization of optical thin filmsApplied Optics, 1979
- Morphology and semiconducting properties of vacuum-evaporated thick cadmium sulphide films prepared by the hot wall techniqueThin Solid Films, 1979
- Controlled texture of reactively rf-sputtered ZnO thin filmsJournal of Applied Physics, 1978
- Structure of vacuum, evaporated CdxZn1–xS thin filmsPhysica Status Solidi (a), 1978