Autostoichiometric vapor deposition: Part I. Theory
- 1 October 1995
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 10 (10) , 2536-2541
- https://doi.org/10.1557/jmr.1995.2536
Abstract
The possibility of an autostoichiometric vapor deposition is explored. Heterometal-organic complexes such as double alkoxides are potential candidate precursors for such deposition. Two reaction schemes, the hydrolysis-assisted pyrolysis and the hydrolysis-polycondensation of double alkoxides, are identified to be autostoichiometric reactions. A simple low-pressure apparatus is suggested for autostoichiometric vapor deposition. Mass-flow analysis allows for the identification of a nonstoichiometry factor K which can be used as a quantitative measure of the precursor's autostoichiometric capability.Keywords
This publication has 12 references indexed in Scilit:
- Synthesis and structural characterization of new copper complexes and the copper-barium-alkoxide complex BaCu4(OC(R)C(H)C(R)O)4(OR')2(HOR')4 (R = C(CH3)3, R' = CH2CH2OCH3)Inorganic Chemistry, 1992
- Ferroelectric thin films prepared by sol-gel processingIntegrated Ferroelectrics, 1992
- Synthesis of bimetallic barium titanium alkoxides as precursors for electrical ceramics. Molecular structure of the new barium titanium oxide alkoxide Ba4Ti13(.mu.3-O)12(.mu.5-O)6(.mu.1-.eta.1-OCH2CH2OCH3)12(.mu.1,.mu.3-.eta.2-OCH2CH2OCH3)12Inorganic Chemistry, 1991
- The synthesis and structural characterization of the europium sandwich [1,1-(THF)2-commo-1,1'-Eu(1,2,4-EuC2B10H12)2]2-Inorganic Chemistry, 1991
- Decomposition Chemistry of TetraethoxysilaneJournal of the American Ceramic Society, 1989
- Metal alkoxides as precursors for electronic and ceramic materialsChemical Reviews, 1989
- The step coverage of undoped and phosphorus-doped SiO2 glass filmsJournal of Vacuum Science & Technology B, 1983
- Modeling of low-pressure deposition of SiO2by decomposition of TEOSIEEE Transactions on Electron Devices, 1979
- Alkali-metal hexa-alkoxides of niobium and of tantalumJ. Chem. Soc. A, 1968
- MASS TRANSFER IN SEMICONDUCTOR TECHNOLOGYIndustrial & Engineering Chemistry, 1966