Analytical model of the “Shot Noise” effect in photoresist
- 31 May 1999
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 46 (1-4) , 365-368
- https://doi.org/10.1016/s0167-9317(99)00105-7
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Resist Surface Roughness Calculated using Theoretical Percolation Model.Journal of Photopolymer Science and Technology, 1998
- Nano edge roughness in polymer resist patternsApplied Physics Letters, 1993
- Modeling of shot noise in x-ray photoresist exposureJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- A statistical analysis of ultraviolet, x-ray, and charged-particle lithographiesJournal of Vacuum Science & Technology B, 1986