Nano edge roughness in polymer resist patterns
- 9 August 1993
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 63 (6) , 764-766
- https://doi.org/10.1063/1.109901
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Acid-diffusion effect on nanofabrication in chemical amplification resistJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1992
- Imaging nanometer scale defects in Langmuir-Blodgett films with the atomic force microscopeLangmuir, 1991
- Molecular-resolution images of Langmuir-Blodgett films and DNA by atomic force microscopyLangmuir, 1991
- Molecular-resolution images of Langmuir–Blodgett films using atomic force microscopyNature, 1991
- Nanostructure technologyIBM Journal of Research and Development, 1988
- Characterization of a high-resolution novolak based negative electron-beam resist with 4 μC/cm2 sensitivityJournal of Vacuum Science & Technology B, 1988
- Observation of single-electron charging effects in small tunnel junctionsPhysical Review Letters, 1987
- Single-electron transistors: Electrostatic analogs of the DC SQUIDSIEEE Transactions on Magnetics, 1987
- Azide-phenolic resin photoresists for deep UV lithographyIEEE Transactions on Electron Devices, 1981
- Resolution Limits of PMMA Resist for Exposure with 50 kV ElectronsJournal of the Electrochemical Society, 1981