Stability of amorphous IrTa diffusion barriers between Cu and Si
- 31 August 1990
- journal article
- Published by Elsevier in Materials Letters
- Vol. 9 (12) , 500-503
- https://doi.org/10.1016/0167-577x(90)90095-4
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- The crystallization temperature of amorphous transition-metal alloysMaterials Letters, 1990
- Thermal stability of thin-film amorphous W-Ru, W-Re, and Ta-Ir alloysJournal of Applied Physics, 1987