Some observations on dielectric breakdown in insulating films
- 1 April 1981
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 78 (3) , 263-269
- https://doi.org/10.1016/0040-6090(89)90592-0
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Electron paramagnetic resonance studies of composite dielctric films of SiO and B2O3Thin Solid Films, 1979
- Electron diffraction study of low loss dielectric filmsThin Solid Films, 1974
- Electrical properties of silicon oxide/boric oxide co-evaporated filmsThin Solid Films, 1972
- An electron spin resonance study of reactively evaporated silicon oxideThin Solid Films, 1971
- A low-loss thin film capacitorThin Solid Films, 1971
- Effects of Material and Processing Parameters on the Dielectric Strength of Thermally Grown SiO[sub 2] FilmsJournal of the Electrochemical Society, 1970
- Interpretation of Destructive Breakdown in Thin Dielectric FilmsJournal of Vacuum Science and Technology, 1969
- Destructive Breakdown in Thin Films of SiO, MgF2, CaF2, CeF3, CeO2 and TeflonJournal of Vacuum Science and Technology, 1969
- The maximum dielectric strength of thin silicon oxide filmsIEEE Transactions on Electron Devices, 1966
- Vacuum deposition of dielectric films for capacitorsVacuum, 1959