Moving mask LIGA (M/sup 2/LIGA) process for control of side wall inclination
- 1 January 1999
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- No. 10846999,p. 252-256
- https://doi.org/10.1109/memsys.1999.746826
Abstract
The side wall inclination of a PMMA microstructure fabricated by deep X-ray lithography has been controlled by moving an X-ray mask in parallel with a PMMA substrate during X-ray exposure. In order to demonstrate the feasibility of this moving mask technology, various conical shape and truncated conical shape microstructures with height of 100-300 /spl mu/m and a diameter of the top and the bottom of truncated conical structures between 0-310 /spl mu/m were fabricated.Keywords
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